Open Access

Roy Zimmermann

• Die Anforderungen an die Lithografie und deren Strukturgrößen steigen kontinuierlich. Die Kosten zur Erzeugung immer kleiner werdender Abbildungen steigen in einem hohen Umfang, denn die Herstellung von ultrapräzisen Laseranlagen sowie auch Projektionssystemen ist enorm zeit- und kostenintensiv. Es wird nach günstigeren Methoden gesucht, um das Investitionsrisiko zu dämpfen. RELACS
• The requirements for the lithography and their structural dimensions continuously rise. The costs of the production of smaller pictures increase in a high way, because the production of ultraexact laser arrangements and projection systems are very time and cost intensely. It is searched for more favorable methods to damp the investment risk. RELACS shows such a technology with an additional step to reduce the structures chemically with already known lithographic technologies without the acquisition of more highly technological arrangements. The integration into the running production expects a stable process with the observance of given parameters. The following investigations and discussions form the basis of the introduction of a new technology. Theoretical basics of diffraction and lithography were briefly outlined, the process step and the results of the focus-/dose optimisation, the layer thick regulation, the cross section pictures and the defective density were introduced.